ORBIS™ 1000 – Scalable MEMS Production Platform
The ORBIS™ 1000 by memsstar is a compact, single-wafer vacuum loadlock platform designed for low-volume MEMS production. Perfectly suited for commercial development and early-stage manufacturing, ORBIS 1000 delivers automated wafer handling, fast cycle times, and seamless integration with XERIC™ and AURIX™ process modules. Engineered for flexibility and growth, the ORBIS 1000 allows a smooth transition to high-volume production via upgrade to the ORBIS 3000, preserving your investment in process modules. The system’s small footprint, onboard chemicals and electronics, and support for all standard substrate sizes (up to 200 mm) make it ideal for cleanroom integration with minimal overhead.
Features
- Compact footprint for cleanroom integration
- Automated single-wafer handling for improved cycle time
- Upgradeable to ORBIS 3000 for high-volume MEMS production
- Onboard chemicals and electronics for non-toxic processes
- Uses industry-standard components for ease of maintenance
- Supports substrate sizes: 100 mm, 125 mm, 150 mm, 200 mm
- Compatible with XERIC™ (XeF₂ silicon etch) and AURIX™ (HF oxide etch) modules
- Full service and maintenance support from memsstar
- Superior process control with small-volume vacuum chambers
- Ideal for carriers, wafers, and diverse substrates
Applications
- Low-volume MEMS manufacturing
- Early-stage MEMS product development
- Pilot-line and commercial prototyping
- Wafer-level MEMS process validation
- Small batch sensor and actuator fabrication
- Integration with MEMS foundry workflows
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