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PLD-Workstation – Advanced Pulsed Laser Deposition System

Pulsed Laser Deposition (PLD) is a powerful and versatile thin-film deposition technique that enables stoichiometric material transfer from target to substrate. The SURFACE PLD-Workstation is an advanced, all-in-one solution designed for research, prototyping, and development of complex thin films, with a special focus on advanced oxide and superlattice structures.
The system integrates laser, gas supply, vacuum chamber, and automation into a single compact rack. This “plug-and-play” design minimizes installation effort while offering exceptional flexibility, safety, and performance — even for users without prior PLD experience.

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Features
  • All-in-one frame for fast plug-and-play installation
  • Advanced process automation, ideal for superlattice deposition
  • Oxygen-resistant substrate heater with advanced temperature measurement up to 1000 °C
  • Optional laser substrate heating
  • Flexible, advanced target manipulator with cross-contamination shielding
  • Vacuum chamber prepared for future upgrades (RHEED, plasma sources, OES, FTIR, etc.)
  • SURFACE Fluence Control option for 100% reproducible results
  • Fully enclosed laser beam line for safe operation
  • Turn-key delivery
    Advanced online support via internet
Applications
  • Oxide thin films
  • Superlattices
  • Functional materials
  • Prototyping
  • Academic and industrial research
  • Advanced material development
Specifications
Parameter Specification
Laser Coherent COMPexPro 201F or 205F
Max pulse energy 0.7 J
Wavelength 248 nm
Laser gases 20 L premix, 10 L He, built-in gas cabinet
Process gases 2 MFC channels, automated pressure control
Substrate heater 1" or 2", up to 1000 °C (other sizes on request)
Substrate rotation 0–50 rpm
Targets 4 × 2", with rotation & track control
Control system PC-based, integrated TFT monitor
IT features LAN, SURFWARE support
Size ~2200 × 850 × 1600 mm
Power supply 3×400 VAC / 50 Hz or 3×208 VAC / 60 Hz
Cooling Integrated chiller (201F)